Photomask and manufacturing method thereof

A photomask including a substrate, a light-blocking main feature and sub-resolution assist features (SRAFs) is provided. The SRAFs are disposed on the substrate and located at least one side of the light-blocking main feature. A space between two adjacent SRAFs is equal to a width of each of the SRA...

Full description

Saved in:
Bibliographic Details
Main Author LAI, YI-KAI
Format Patent
LanguageChinese
English
Published 01.09.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:A photomask including a substrate, a light-blocking main feature and sub-resolution assist features (SRAFs) is provided. The SRAFs are disposed on the substrate and located at least one side of the light-blocking main feature. A space between two adjacent SRAFs is equal to a width of each of the SRAFs, and a light transmittance of the SRAFs is 100%.
Bibliography:Application Number: TW20176105460