Fumed silica and production method therefor

• Main Authors: TAKATA, YUKIHIRO, HORITSUNE, JUNYA, UEDA, MASAHIDE
• Format: Patent
• Language: Chinese; English
• Published: 16.08.2018
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMISTRY; COMPOUNDS THEREOF; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INORGANIC CHEMISTRY; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; NON-METALLIC ELEMENTS; PAINTS; POLISHES; SEMICONDUCTOR DEVICES

Provided is a fumed silica for chemical-mechanical polishing with which post-polishing scratches occurring on a surface of an object to be polished can be significantly reduced, and which is important for miniaturization and multi-layering of a structure. The fumed silica according to the present invention has a BET specific surface area of 57-400 m2/g. In a liquid dispersion which is obtained by ultrasonically dispersing 6.25 mass% of this fumed silica in water at a vibration frequency of 20 kHz and an amplitude of 15-25 [mu]m for 3 minutes, the amount of residues on a sieve is 5 ppm or less as measured by wet sieving using an electroformed sieve having a mesh opening size of 5 [mu]m.