Fumed silica and production method therefor

Provided is a fumed silica for chemical-mechanical polishing with which post-polishing scratches occurring on a surface of an object to be polished can be significantly reduced, and which is important for miniaturization and multi-layering of a structure. The fumed silica according to the present in...

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Bibliographic Details
Main Authors TAKATA, YUKIHIRO, HORITSUNE, JUNYA, UEDA, MASAHIDE
Format Patent
LanguageChinese
English
Published 16.08.2018
Subjects
ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMISTRY
COMPOUNDS THEREOF
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INORGANIC CHEMISTRY
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
NON-METALLIC ELEMENTS
PAINTS
POLISHES
SEMICONDUCTOR DEVICES
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Summary:Provided is a fumed silica for chemical-mechanical polishing with which post-polishing scratches occurring on a surface of an object to be polished can be significantly reduced, and which is important for miniaturization and multi-layering of a structure. The fumed silica according to the present invention has a BET specific surface area of 57-400 m2/g. In a liquid dispersion which is obtained by ultrasonically dispersing 6.25 mass% of this fumed silica in water at a vibration frequency of 20 kHz and an amplitude of 15-25 [mu]m for 3 minutes, the amount of residues on a sieve is 5 ppm or less as measured by wet sieving using an electroformed sieve having a mesh opening size of 5 [mu]m.
Bibliography:Application Number: TW20176137148