Method for manufacturing a fine metal mask using electroplating

Disclosed is a method for manufacturing a fine metal mask using electroplating. The method includes: (a) forming a sacrificial layer on a carrier; (b) forming an electrode layer on the sacrificial layer; (c) forming a photoresist film on the electrode layer; (d) patterning the photoresist film throu...

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Bibliographic Details
Main Authors SHIN, HEUNG-HYUN, KIM, CHI-WOO, PARK, JONG-KAB
Format Patent
LanguageChinese
English
Published 16.03.2018
Subjects
APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Summary:Disclosed is a method for manufacturing a fine metal mask using electroplating. The method includes: (a) forming a sacrificial layer on a carrier; (b) forming an electrode layer on the sacrificial layer; (c) forming a photoresist film on the electrode layer; (d) patterning the photoresist film through photolithography; (e) forming an electroplated layer; (f) removing the patterned photoresist film, thereby leaving the electroplated layer serving as a metal pattern; (g) patterning the electrode layer to form a pattern corresponding to the metal pattern, thereby forming a mask pattern including the electroplated layer and the electrode layer; (h) performing thermal treatment to increase the hardness of the mask pattern; (i) inspecting the mask pattern; and (j) separating the mask pattern from the carrier.
Bibliography:Application Number: TW20170119945