Process for depositing a metal or metal alloy on a surface of a substrate including its activation

• Main Authors: NGUYEN, TANG CAM LAI, WENDELN, CHRISTIAN, STAMP, LUTZ, WURDINGER, KAY, KRILLES, GERSON, DOSSE, BEXY
• Format: Patent
• Language: Chinese; English
• Published: 01.03.2018
• Subjects: CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; METALLURGY; PRINTED CIRCUITS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to a process for depositing a metal or metal alloy on at least one surface of a substrate comprising the steps of (a) providing said substrate; (b) treating the surface of said substrate with an activation solution comprising at least one source of metal ions selected from the group consisting of ruthenium, rhodium, palladium, osmium, iridium, platinum, copper, silver, nickel, cobalt, gold and mixtures thereof such that at least one portion of said metal ions is being adsorbed on the surface of said substrate; (c) treating the surface of said substrate obtained from step (b) with a treatment solution comprising (i) at least one additive independently selected from the group consisting of thiols, thioethers, disulphides and sulphur containing heterocycles, and (ii) at least one reducing agent suitable to reduce the metal ions adsorbed on the surface of said substrate selected from the group consisting of boron based reducing agents, sources of hypophosphite ions, hydrazine and hyd