Negative tone photosensitive resin composition, curable film and touch panel component

To provide a negative type photosensitive composition capable of being developed by a low concentration alkali development liquid, capable of being cured at low temperature and capable of providing a cured film high in transparency, chemical resistance and environment resistance, and a pattern forma...

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Bibliographic Details
Main Authors YOKOYAMA, DAISHI, TANIGUCHI, KATSUTO, MISUMI, MOTOKI, KUZAWA, MASAHIRO
Format Patent
LanguageChinese
English
Published 16.02.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:To provide a negative type photosensitive composition capable of being developed by a low concentration alkali development liquid, capable of being cured at low temperature and capable of providing a cured film high in transparency, chemical resistance and environment resistance, and a pattern formation method using the same. There is provided a negative photosensitive composition containing (I) an alkali soluble resin which is a polymer containing a polymerization unit containing a carboxyl group and a polymerization unit containing an alkoxysilyl group, (II) polysiloxane, (II) a compound containing two or more (meth)acryloyloxy group, (IV) a compound containing two or more (i) a silicone derivative having a specific structure and/or (ii) an epoxy group, (V) a polymerization initiator, and (VI) a solvent.
Bibliography:Application Number: TW20176110428