Substrate alignment method, substrate receiving method, substrate liquid processing method, substrate alignment device, substrate receiving device, substrate liquid processing device, and substrate processing system

An object of the invention is to prevent a substrate from contacting substrate support bodies and other substrates even when warping (deformation) of the substrate occurs. The present invention is configured such that the substrate support body (39) can be moved toward the center of a substrate (8)...

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Bibliographic Details
Main Authors HOSHINO, HIROZUMI, ONZUKA, KEIJI
Format Patent
LanguageChinese
English
Published 16.09.2017
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Summary:An object of the invention is to prevent a substrate from contacting substrate support bodies and other substrates even when warping (deformation) of the substrate occurs. The present invention is configured such that the substrate support body (39) can be moved toward the center of a substrate (8) from a position other than positions (A and C) at which the substrate (8) is partially warped upward along the outer peripheral edge and positions (B and D) at which it is warped downward. The present invention can be applied to a substrate alignment method (substrate alignment device) that aligns one or a plurality of substrates (8), a substrate receiving method (substrate receiving device) where the substrate (8) is received by the substrate support body (39), a substrate liquid processing method (substrate liquid processing device) that can process a plurality of substrates (8) in a single batch, and a substrate processing system (1) that incorporates such a substrate alignment device, substrate receiving device
Bibliography:Application Number: TW20165140972