Microfluidic channel with developer port

An example microfluidic device comprises a substrate having a first surface and a cover layer above the first surface. The cover layer and the first surface form a microfluidic channel and a chamber. The example microfluidic device further comprises a functional port in the cover layer over the cham...

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Bibliographic Details
Main Authors DONALDSON, JEREMY HARLAN, HAGER, MICHAEL, STRAND, THOMAS R, GOVYADINOV, ALEXANDER
Format Patent
LanguageChinese
English
Published 01.09.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASURING
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TESTING
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Summary:An example microfluidic device comprises a substrate having a first surface and a cover layer above the first surface. The cover layer and the first surface form a microfluidic channel and a chamber. The example microfluidic device further comprises a functional port in the cover layer over the chamber and at least one developer port in the cover layer over the microfluidic channel. The developer port is above a portion of the microfluidic channel that is not proximate to the functional port.
Bibliography:Application Number: TW20165141202