Substrate treatment apparatus, method for manufacturing semiconductor device, and recording medium

• Main Authors: OKUNO, MASAHISA, TSUKAMOTO, TAKASHI, KAKUDA, TORU, HORII, SADAYOSHI, TATENO, HIDETO, TANAKA, AKINORI, HARA, DAISUKE, JODA, TAKUYA
• Format: Patent
• Language: Chinese; English
• Published: 01.07.2017
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Provided is a substrate treatment apparatus having: a treatment chamber that stores a substrate; a vaporizer, which generates a reaction gas by vaporizing a liquid starting material, and sends, as a treatment gas, the reaction gas with a carrier gas, and which is provided with a vaporizing container, a liquid starting material introducing unit, a carrier gas introducing unit, and a heater that heats the liquid starting material; a carrier gas supply control unit that controls the supply quantity of the carrier gas; a liquid starting material supply control unit that controls the supply quantity of the liquid starting material; a treatment gas supply tube that introduces the treatment gas to the inside of the treatment chamber; a treatment gas temperature sensor that detects the temperature of the treatment gas sent into the treatment gas supply tube from the vaporizer.