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Summary:The invention relates to the electronic component field and discloses a low resistance transparent conductive film and a preparation method. The low resistance transparent conductive film comprises a metal mesh hole film layer having a plurality of unordered holes, a transparent bottom film arranged on the lower surface of the metal film layer and a transparent conductive film layer arranged on the upper surface of the metal film layer; and the low resistance transparent conductive film is obtained through depositing the transparent bottom film on a substrate, then depositing the metal mesh hole film layer having the plurality of unordered holes through a micro-ball dipping dip plating method and then depositing a transparent conductive film layer. Because the metal mesh hole film has the unique structure of unordered holes, and the low resistance transparent conductive film has better conductivity than the current transparent conductive film in the prior art, high visible light transmittance rate and neutral
Bibliography:Application Number: TW20150138243