Cleaning liquid for photoresist residue removal

This invention related to a kind of cleaning liquid used for removing photoresist residue, wherein, it contains alkanolamine, esters and non-ester solvent. This cleaning liquid has a low corrosion rate for metal or non-metal materials and has a better compatibility with quartz device.

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Bibliographic Details
Main Authors SUN, GUANG-SHENG, HUANG, DA-HUI, LIU, BING
Format Patent
LanguageChinese
English
Published 01.03.2017
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CANDLES
CHEMISTRY
CINEMATOGRAPHY
DETERGENT COMPOSITIONS
DETERGENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
FATTY ACIDS THEREFROM
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
RECOVERY OF GLYCEROL
RESIN SOAPS
SEMICONDUCTOR DEVICES
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
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Summary:This invention related to a kind of cleaning liquid used for removing photoresist residue, wherein, it contains alkanolamine, esters and non-ester solvent. This cleaning liquid has a low corrosion rate for metal or non-metal materials and has a better compatibility with quartz device.
Bibliography:Application Number: TW20160128009