Reflective photomask and a reflection-type mask blank corresponding the same

A reflective photomask includes a substrate (110) with a substrate layer (115) of a low thermal expansion material. The substrate layer (115) includes a main portion (112) of a first structural configuration and an auxiliary portion (111) of a second structural configuration of the low thermal expan...

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Bibliographic Details
Main Authors SCHEDEL, THORSTEN, BENDER, MARKUS
Format Patent
LanguageChinese
English
Published 16.02.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A reflective photomask includes a substrate (110) with a substrate layer (115) of a low thermal expansion material. The substrate layer (115) includes a main portion (112) of a first structural configuration and an auxiliary portion (111) of a second structural configuration of the low thermal expansion material. The auxiliary portion (111) is formed in a frame section (220) surrounding a pattern section (211) of the substrate (110). A multilayer mirror (125) is formed on a first surface of the substrate (110). A reflectivity of the multilayer mirror (125) is at least 50% at an exposure wavelength below 15 nm. A frame trench (310) extending through the multilayer mirror (125) exposes the substrate (110) in the frame section (220). The auxiliary portion (111) may include scatter centres for out-of-band radiation.
Bibliography:Application Number: TW20165116022