Lithographic apparatus

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus compr...

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Main Authors ENDENDIJK, WILFRED EDWARD, ARLEMARK, ERIK JOHAN, LEVASIER, LEON MARTIN, VAN DER SANDEN, JACOBUS CORNELIS GERARDUS, DONDERS, SJOERD NICOLAAS LAMBERTUS, LAFARRE, RAYMOND WILHELMUS LOUIS, JANSSEN, FRANCISCUS JOHANNES JOSEPH, KOEVOETS, ADRIANUS HENDRIK, DERKS, SANDER CATHARINA REINIER, OVERKAMP, JIM VINCENT, TEN KATE, NICOLAAS
Format Patent
LanguageChinese
English
Published 16.12.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
AbstractList A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
Author DERKS, SANDER CATHARINA REINIER
LAFARRE, RAYMOND WILHELMUS LOUIS
KOEVOETS, ADRIANUS HENDRIK
TEN KATE, NICOLAAS
OVERKAMP, JIM VINCENT
DONDERS, SJOERD NICOLAAS LAMBERTUS
LEVASIER, LEON MARTIN
ARLEMARK, ERIK JOHAN
ENDENDIJK, WILFRED EDWARD
JANSSEN, FRANCISCUS JOHANNES JOSEPH
VAN DER SANDEN, JACOBUS CORNELIS GERARDUS
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– fullname: DONDERS, SJOERD NICOLAAS LAMBERTUS
– fullname: LAFARRE, RAYMOND WILHELMUS LOUIS
– fullname: JANSSEN, FRANCISCUS JOHANNES JOSEPH
– fullname: KOEVOETS, ADRIANUS HENDRIK
– fullname: DERKS, SANDER CATHARINA REINIER
– fullname: OVERKAMP, JIM VINCENT
– fullname: TEN KATE, NICOLAAS
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Snippet A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a...
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title Lithographic apparatus
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