Lithographic apparatus

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus compr...

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Bibliographic Details
Main Authors ENDENDIJK, WILFRED EDWARD, ARLEMARK, ERIK JOHAN, LEVASIER, LEON MARTIN, VAN DER SANDEN, JACOBUS CORNELIS GERARDUS, DONDERS, SJOERD NICOLAAS LAMBERTUS, LAFARRE, RAYMOND WILHELMUS LOUIS, JANSSEN, FRANCISCUS JOHANNES JOSEPH, KOEVOETS, ADRIANUS HENDRIK, DERKS, SANDER CATHARINA REINIER, OVERKAMP, JIM VINCENT, TEN KATE, NICOLAAS
Format Patent
LanguageChinese
English
Published 16.12.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
Bibliography:Application Number: TW20165111539