Scanning exposure device

• Main Authors: TANAKA, SHIGEKI, YOSHIDA, YUJI, KANBE, MAKOTO, ARAI, TOSHINARI, KATAYOSE, KEITA, SUZUKI, HIDEYUKI, MATSUMOTO, MINEYUKI
• Format: Patent
• Language: Chinese; English
• Published: 16.12.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The purpose of the present invention is to prevent exposure variations in the vicinity of edge parts of a substrate when furthering increased luminance of a light source and increasing the speed of a scanning rate to improve tact time and improve throughput in a scanning exposure device. A scanning exposure device (1) is provided with: a stage (2) which is provided with a gap (2S) with a stage surface (2A) for holding a substrate (W); a light source unit (3) for illuminating a light illumination region (3L), which is provided so as to extend along one direction on the substrate (W), with light; and a scanning device (4) that moves one or both of the stage (2) and the light source unit (3) along a scanning direction (S) crossing the one direction relative to each other. An acceleration space (F) is provided for the scanning device (4) from a position in which the stage (2) and light source unit (3) stand still to the entry of the substrate (W) held on the stage (2) into the light exposure region (3L). The stag