Layout design system and system for fabricating mask pattern using the same

• Main Authors: JUNG, JI-YOUNG, PARK, SUNG-KEUN, PARK, YOUNG-GOOK, KIM, DONG-GYUN, KANG, DAE-KWON, YANG, JAE-SEOK
• Format: Patent
• Language: Chinese; English
• Published: 16.10.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CALCULATING; CINEMATOGRAPHY; COMPUTING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A layout design system and a system for fabricating a mask pattern using the same are provided. The layout design system includes a processor, a storage unit configured to store a layout design, and a stitch module. The layout design includes a first pattern group and a second pattern group disposed in accordance with a design. The first pattern group including a first pattern for patterning at a first time. The second pattern group including a second pattern for patterning at a second time that is different than the first time. The stitch module is configured to detect an iso-pattern of the second pattern using the processor. The stitch module is configured to repetitively designate at least one of the first pattern, which is spaced apart from the iso-pattern by a pitch or more, to the second pattern group using the processor.