Apparatus and method for thermally treating substrates

The invention relates to an apparatus and a method for treating one or more substrates (2), comprising a process chamber (3) and a susceptor (1) which can be heated by a heating device (4) which comprises a plurality of zone heating devices (4'), wherein a first zone heating device (4') he...

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Bibliographic Details
Main Authors LANGNER, JOST-MARTIN, LUENENBUERGER, MARKUS, THERES, ARNE
Format Patent
LanguageChinese
English
Published 16.10.2016
Subjects
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