Apparatus and method for thermally treating substrates
The invention relates to an apparatus and a method for treating one or more substrates (2), comprising a process chamber (3) and a susceptor (1) which can be heated by a heating device (4) which comprises a plurality of zone heating devices (4'), wherein a first zone heating device (4') he...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
16.10.2016
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Subjects | |
Online Access | Get full text |
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