Positive photosensitive siloxane composition, active matrix substrate, display device, and method for producing active matrix substrate

• Main Authors: NODERA, NOBUTAKE, FUKE, TAKASHI, KATO, MASAHIRO, YOKOYAMA, DAISHI, TANIGUCHI, KATSUTO, SHINOZUKA, AKIHIRO, KOIWA, SHINJI, MATSUMOTO, TAKAO
• Format: Patent
• Language: Chinese; English
• Published: 16.08.2016
• Subjects: ADVERTISING; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; CRYPTOGRAPHY; DISPLAY; DISPLAYING; EDUCATION; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; LABELS OR NAME-PLATES; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEALS; SEMICONDUCTOR DEVICES; SIGNS

Provided are: a positive photosensitive siloxane composition which allows a film formed therefrom to have high heat resistance, high strength, and high crack resistance; an active matrix substrate with which no by-products are generated, defect occurrence is suppressed, an interlayer insulating film is easily formed at low cost, and transmittance is good; a display device provided with the active matrix substrate; and a method for producing the active matrix substrate. An active matrix substrate 30 has, on an insulating substrate 10, a plurality of gate wires 11 provided so as to extend in parallel to each other, and a plurality of source wires 12 provided so as to extend in parallel to each other in a direction intersecting with the respective gate wires 11. An interlayer insulating film 14 and a gate insulating film 15 are interposed below the source wires 12 at a portion including the portion where the gate wires 11 and the source wires 12 intersect. The interlayer insulating film 14 is formed using a posi