Multi-mask alignment system and method
In a multi-mask alignment system and method, a carrier frame is provided having a number of apertures therethrough. A number of shadow mask - frame combinations are also provided. Each shadow mask - frame combination includes a first set of alignment features and each shadow mask - frame combination...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
16.05.2016
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Subjects | |
Online Access | Get full text |
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Summary: | In a multi-mask alignment system and method, a carrier frame is provided having a number of apertures therethrough. A number of shadow mask - frame combinations are also provided. Each shadow mask - frame combination includes a first set of alignment features and each shadow mask - frame combination is positioned on a first side of the carrier with the frame supporting the shadow mask in alignment with one of the apertures. An alignment system is provided and a control system including a programmed controller is also provided. Under the control of the controller, the alignment system is caused to adjust the position of each shadow mask - frame combination with respect to the carrier based on positons of the first set of alignment features determined by the controller. |
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Bibliography: | Application Number: TW20150134046 |