Substrate support with more uniform edge purge

Embodiments of substrate supports are provided herein. In some embodiments, a substrate support includes: a first plate for supporting a substrate, the first plate having a plurality of purge gas channels on a backside of the first plate; a second plate disposed beneath and supporting the first plat...

Full description

Saved in:
Bibliographic Details
Main Authors MATSUSHITA, TOMOHARU, KAMATH, ARAVIND MIYAR, YUAN, XIAOXIONG, TSAI, CHENG-HSIUNG MATTHEW, KOPPA, MANJUNATHA, RAVI, JALLEPALLY
Format Patent
LanguageChinese
English
Published 01.04.2016
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:Embodiments of substrate supports are provided herein. In some embodiments, a substrate support includes: a first plate for supporting a substrate, the first plate having a plurality of purge gas channels on a backside of the first plate; a second plate disposed beneath and supporting the first plate; and an edge ring surrounding the first plate and disposed above the second plate, wherein the plurality of purge gas channels extend from a single inlet in a central portion to a plurality of outlets at a periphery of the first plate, and wherein the plurality of purge gas channels have a substantially equal flow conductance.
Bibliography:Application Number: TW20154119261