Alkali-soluble resin, photosensitive resin composition, and use thereof

• Main Authors: FUKATSU, YUTA, KUZAWA, MASAHIRO, IIDA, HIROO
• Format: Patent
• Language: Chinese; English
• Published: 01.04.2016
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS

This alkali-soluble resin comprises a copolymer dissolved in a solvent, the copolymer including a polymeric unit containing a carboxyl group based on an unsaturated carboxylic acid, etc. and a polymeric unit containing an alkoxysilyl group based on a monomer of formula (1) below. The solvent is a specific alcohol having a linear or branched chain alkyl group having 4 or 5 carbon atoms. The specific alcohol is preferably a primary alcohol with an alkyl group having 4 carbon atoms, and more preferably 1-butanol. X-(CH2)a-Si(OR)b(CH3)3-b (1) In formula (1), X is a vinyl group, styryl group, or (meth)acryloyl group, R is a methyl group or ethyl group, a is an integer of 0-3, and b is an integer of 1-3.