Isotopically-enriched boron-containing compounds, and methods of making and using same

An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound...

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Main Authors YEDAVE, SHARAD N, JONES, EDWARD E, TANG, YING, SWEENEY, JOSEPH D, CHAMBERS, BARRY LEWIS, KAIM, ROBERT, BYL, OLEG, ZOU, PENG, RAY, RICHARD S
Format Patent
LanguageChinese
English
Published 16.03.2016
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Summary:An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.
Bibliography:Application Number: TW20154137028