Device and method for liquid treating substrate, and computer readable storage medium recording substrate liquid treating program

• Main Authors: TANAKA, KOJI, NAGAMATSU, TATSUYA, MIZOTA, SHOGO, MAEZONO, TOMIYASU, NONAKA, JUN, SAIKI, DAISUKE, YABUTA, TAKASHI
• Format: Patent
• Language: Chinese; English
• Published: 16.01.2016
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

This invention aims to cleanse (i.e. remove particles from) a treating liquid used for liquid treatment of a substrate without deteriorating the treating liquid. This invention provides a substrate liquid treating device (1) for treating a substrate (3) with a treating liquid and a method thereof, and a computer readable storage medium (12) recording a liquid treatment program for a substrate. First, a liquid chemical supplying process (S1, S6, S12) is performed to supply a first liquid chemical from a first liquid chemical supplying section (17) to a treating liquid storage section (14). Then, a first liquid chemical cleaning process (S2, S7, S13) is conducted in a liquid chemical cleaning section (51) for cleaning the first liquid chemical. Next, a second liquid chemical supplying process (S3, S8, S14) is performed to supply the second liquid chemical from the second liquid chemical supplying section (18) to the treating liquid storage (14). Finally, a treating liquid supplying process (S5, S11, S17) is con