Lithography apparatus, and method of manufacturing article
The present invention provides a lithography apparatus which forms a pattern by sequentially irradiating a first region and a second region on a substrate with a beam, the apparatus including a beam detector configured to detect the beam, and a processor configured to obtain position information of...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
16.12.2015
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention provides a lithography apparatus which forms a pattern by sequentially irradiating a first region and a second region on a substrate with a beam, the apparatus including a beam detector configured to detect the beam, and a processor configured to obtain position information of the second region by giving a weight to first position information of the second region based on an output from the beam detector before irradiation of the first region with the beam, and giving a weight to second position information of the second region based on an output from the beam detector after the irradiation. |
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Bibliography: | Application Number: TW20154115609 |