Contact geometry for processing object, electrostatic chuck and manufacturing method thereof

A contact geometry for processing object in the chamber is provided. The contact geometry includes a grid-type groove and a protrusion structure array surrounding the grid-type groove. The contact geometry is easily and quickly formed by using a mask. A minor protrusion geometry array still maintain...

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Bibliographic Details
Main Authors LEE, SOON-JAE, LEE, MYUNG-HO, KIM, YOUNG-HO, LEE, SEUNG-HO, HWANG, SEOK-JAE, CHOI, YOUNG-HOON, SEO, KWANG-SUN
Format Patent
LanguageChinese
English
Published 01.12.2015
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A contact geometry for processing object in the chamber is provided. The contact geometry includes a grid-type groove and a protrusion structure array surrounding the grid-type groove. The contact geometry is easily and quickly formed by using a mask. A minor protrusion geometry array still maintains a relatively uniform contact ratio after long-term use and further inhibits problems, such as stains.
Bibliography:Application Number: TW20150102171