Radiation source

The present invention is concerned with a free electron laser. The free electron laser comprises an electron source operable to emit a beam of electrons, a particle accelerator operable to accelerate the beam of electrons to relativistic energies, an undulator operable to guide the relativistic elec...

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Bibliographic Details
Main Authors BARTRAIJ, PETRUS RUTGERUS, AKKERMANS, JOHANNES ANTONIUS GERARDUS, LOOPSTRA, ERIK ROELOF, BANINE, VADIM YEVGENYEVICH, DONKER, RILPHO LUDOVICUS
Format Patent
LanguageChinese
English
Published 16.10.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
DEVICES USING STIMULATED EMISSION
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Summary:The present invention is concerned with a free electron laser. The free electron laser comprises an electron source operable to emit a beam of electrons, a particle accelerator operable to accelerate the beam of electrons to relativistic energies, an undulator operable to guide the relativistic electron beam along a periodic path so as to stimulate emission of coherent radiation and a steering unit operable to alter the trajectory of the electron beam so as to direct the electron beam from a first path along which the electron beam propagates substantially in a first direction to a second path along which the electron beam propagates substantially in a second direction, wherein the first path and the second path are vertically separated from one another.
Bibliography:Application Number: TW20150108215