Extreme ultra-violet (EUV) inspection systems

Disclosed are methods and apparatus for reflecting, towards a sensor, extreme ultra-violet (EUV) light that is reflected from a target substrate. The system includes a first mirror arranged to receive and reflect the EUV light that is reflected from the target substrate, a second mirror arranged to...

Full description

Saved in:
Bibliographic Details
Main Author KVAMME, DAMON F
Format Patent
LanguageChinese
English
Published 16.08.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
COLORIMETRY
ELECTROGRAPHY
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
RADIATION PYROMETRY
TESTING
Online AccessGet full text

Cover

More Information
Summary:Disclosed are methods and apparatus for reflecting, towards a sensor, extreme ultra-violet (EUV) light that is reflected from a target substrate. The system includes a first mirror arranged to receive and reflect the EUV light that is reflected from the target substrate, a second mirror arranged to receive and reflect the EUV light that is reflected by the first mirror, a third mirror arranged to receive and reflect the EUV light that is reflected by the second mirror, and a fourth mirror arranged to receive and reflect the EUV light that is reflected by the third mirror. The first mirror has an aspherical surface. The second, third, and fourth mirrors each have a spherical surface.
Bibliography:Application Number: TW20150100589