Beam delivery apparatus and method

A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form one or more branch radiation beams for provision to one o...

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Bibliographic Details
Main Authors AMENT, LUCAS JOHANNES PETER, LOOPSTRA, ERIK ROELOF, NIKIPELOV, ANDREY ALEXANDROVICH, NIENHUYS, HAN-KWANG, KRUIZINGA, BORGERT, BANINE, VADIM YEVGENYEVICH, FRIJNS, OLAV WALDEMAR VLADIMIR, DE JAGER, PIETER WILLEM HERMAN, DONKER, RILPHO LUDOVICUS, RENKENS, MICHAEL JOZEF MATHIJS, VAN GORKOM, RAMON PASCAL, BARTRAIJ, PETRUS RUTGERUS, GRIMMINCK, LEONARDUS ADRIANUS GERARDUS, DE VRIES, GOSSE CHARLES, JANSSEN, FRANCISCUS JOHANNES JOSEPH, KATALENIC, ANDELKO, ENGELEN, WOUTER JOEP
Format Patent
LanguageChinese
English
Published 16.06.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form one or more branch radiation beams for provision to one or more tools.
Bibliography:Application Number: TW20143133157