Inductor structure and method for forming the same

Embodiments of mechanisms of forming an inductor structure are provided. The inductor structure includes a substrate and a first dielectric layer formed over the substrate. The inductor structure includes a first metal layer formed in the first dielectric layer and a second dielectric layer over the...

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Bibliographic Details
Main Authors TSENG, YUAN-TAI, CHOU, CHUNG-YEN, LIU, MINGYI, TSAI, CHIA-SHIUNG
Format Patent
LanguageChinese
English
Published 16.04.2015
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRICITY
INDUCTANCES
MAGNETS
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
TRANSFORMERS
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Summary:Embodiments of mechanisms of forming an inductor structure are provided. The inductor structure includes a substrate and a first dielectric layer formed over the substrate. The inductor structure includes a first metal layer formed in the first dielectric layer and a second dielectric layer over the first metal layer. The inductor structure further includes a magnetic layer formed over the first dielectric layer, and the magnetic layer has a top surface, a bottom surface and sidewall surfaces between the top surface and the bottom surface, and the sidewall surfaces have at least two intersection points.
Bibliography:Application Number: TW20143115768