Etching composition and application thereof

The invention provides an etching composition having a salt and a solvent. The salt includes an anion and a cation. The anion has a structure formed by fluorine atom and phosphorus atom bonding with a single bond.

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Bibliographic Details
Main Authors TSUKAHARA, TOMOAKI, KUMASHIRO, YASUSHI, KODAMA, SHUNSUKE
Format Patent
LanguageChinese
English
Published 01.02.2015
Subjects
ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMISTRY
DYES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
SEMICONDUCTOR DEVICES
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Summary:The invention provides an etching composition having a salt and a solvent. The salt includes an anion and a cation. The anion has a structure formed by fluorine atom and phosphorus atom bonding with a single bond.
Bibliography:Application Number: TW20140118715