Method for compensating an exposure image

A method for compensating an exposure image is provided. An original exposure image is compensated according to etching factors, and then a patterned photoresist layer is produced according to the compensated exposure image. Then, a conductive layer on a PCB is patterned by wet etching with the patt...

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Bibliographic Details
Main Authors HUANG, SHANG-FENG, HUANG, HAN-PEI, YU, CHENG-PO
Format Patent
LanguageChinese
English
Published 01.01.2015
Subjects
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
PRINTED CIRCUITS
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Summary:A method for compensating an exposure image is provided. An original exposure image is compensated according to etching factors, and then a patterned photoresist layer is produced according to the compensated exposure image. Then, a conductive layer on a PCB is patterned by wet etching with the patterned photoresist layer. Measured errors of linewidth of the conductive circuit present a result caused by other etching factors not considered. When the measured linewidth exceeds a predetermined range, the factors not considered on the impact of the etching results are summarized and an error value is calculated, compensating data matching each point of the conductive layer on the PCB are recalculated by substituting the error value, and a patterned photoresist layer and a corresponding conductive circuit are produced again according to the compensating data. When the measured linewidth falls into the predetermined range, the current compensating data are the best ones.
Bibliography:Application Number: TW20130121989