Apparatus for providing and directing heat energy in a process chamber

Apparatus for providing heat energy to a process chamber are provided herein. The apparatus may include a process chamber body of the process chamber, a solid state source array having a plurality of solid state sources, disposed on a first substrate, to provide heat energy to the process chamber to...

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Bibliographic Details
Main Authors HUNTER, AARON MUIR, JOHNSON, JOSEPH, ABRAHAM, MATHEW, GERLING, JOHN, NAINANI, ANEESH, RANISH, JOSEPH M
Format Patent
LanguageChinese
English
Published 01.07.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Apparatus for providing heat energy to a process chamber are provided herein. The apparatus may include a process chamber body of the process chamber, a solid state source array having a plurality of solid state sources, disposed on a first substrate, to provide heat energy to the process chamber to heat a target component disposed in the process chamber body, and at least one reflector disposed on the first substrate proximate to one or more of the plurality of solid state sources to direct heat energy provided by the one or more of the plurality of solid state sources towards the target component.
Bibliography:Application Number: TW20130137006