Loading port, wafer processing system, and method of operating a wafer processing system

A loading port includes a housing and a plurality of stations defined in the housing configured to receive a front opening universal pod(FOUP). The loading port further includes a connector configured to receive an inert gas. At least one of the plurality of stations is configured to deliver the ine...

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Bibliographic Details
Main Authors TSAI, WENANG, TSAI, YUNG-LI, CHIANG, YUANIH, CHANG, JUIUAN, KU, SHAO-YEN, HSIEH, CHING-WEI
Format Patent
LanguageChinese
English
Published 01.06.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A loading port includes a housing and a plurality of stations defined in the housing configured to receive a front opening universal pod(FOUP). The loading port further includes a connector configured to receive an inert gas. At least one of the plurality of stations is configured to deliver the inert gas to the FOUP to purge an interior of the FOUP of moisture. A system including the loading port and a method of using the system are also described.
Bibliography:Application Number: TW20132140631