Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist

• Main Authors: CHRISTIANSON, MATTHEW D, ONGAYI, OWENDI, MEYER, MATTHEW M
• Format: Patent
• Language: Chinese; English
• Published: 01.01.2014
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

A copolymer comprises the polymerized product of a dissolution-rate controlling monomer having the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, provided Ra is C1-10 fluoroalkyl for at least one instance of the monomer of formula (I), X is O or NR wherein R is H, a C1-10 alkyl, or a C6-10 aryl, Z1 is a C1-20 alkylene, C3-20 cycloalkylene, C6-20 arylene, or C7-20 aralkylene, wherein Z1 optionally comprises an aromatic or non-aromatic hydroxyl, sulfonate, sulfonic acid, sulfonamide, sulfonimide, carboxylic acid, ester, carbonate, amide, or a combination comprising at least one of the foregoing, each Rb is independently H or a C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl, wherein Rb optionally comprises F, -C(=O)-O-, or a combination comprising at least one of the foregoing, Rc is a C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl, wherein Rc optionally compri