Critical dimension uniformity monitoring for extreme ultra-violet reticles

• Main Authors: POKROVSKIY, ALEX, SOUSA, WESTON L, SEZGINER, ABDURRAHMAN, SHI, RUI-FANG
• Format: Patent
• Language: Chinese; English
• Published: 16.12.2013
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Disclosed are methods and apparatus for facilitating an inspection of a sample using an optical inspection tool. An optical inspection tool is used to obtain an optical image or signal from an EUV reticle that specifies an intensity variation across the EUV reticle, and this intensity variation is c...