Apparatus and method of leveling a substrate in a charged particle lithography system and a cantilever-based sensor for leveling a substrate

• Main Authors: CHEN, JENG-HORNG, WANG, SHIHI
• Format: Patent
• Language: Chinese; English
• Published: 16.11.2013
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TESTING

The present disclosure describes an apparatus of leveling a substrate in a charged particle lithography system. In an example, the apparatus includes a cantilever-based sensor that includes an optical sensor and a cantilever structure. The optical sensor determines a distance between the optical sensor and a surface of the substrate based on light reflected from the cantilever structure. In an example, a first distance is between the cantilever structure and optical sensor, a second distance is a height of the cantilever structure, and a third distance is between the optical sensor and the surface of the substrate. The optical sensor determines the first distance based on the light reflected from the cantilever structure, such that the third distance is determined from the first distance and the second distance.