Residual image testing method and system

• Main Authors: LIN, KUAN-MING, CHANG, LI-HSIN, HSU, CHIHUN, TASI, MIN-RUEI
• Format: Patent
• Language: Chinese; English
• Published: 01.11.2013
• Subjects: DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The invention provides a residual image testing method, which is applicable to testing the residual image of a device under test; the device under test is composed of two substrates spaced apart from each other, two alignment layers disposed on the same side of the substrates, a liquid crystal layer interposed between said alignment layers and two electrodes disposed on opposite sides of the substrates. The residual image testing method includes the following steps: applying an incident light on the device under test; imposing a first alternating voltage to the electrode of the device under test; imposing a direct voltage to the electrode of the device under test, where the direct voltage is greater than or equal to ten voltages; and imposing a second alternating voltage to the electrode of the device under test, and measuring the intensity of light penetrating the device under test. The invention further provides a residual image testing system.