Co-based alloy sputtering target and co-based alloy material for magnetic recording media
The present invention provides a Co-based alloy sputtering target. The sputtering target comprises a Co-based alloy phase and a nonmagnetic ternary compound phase including at least one nonmagnetic ternary compound. In addition, the present invention also provides a Co-based alloy material, which is...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
16.09.2013
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention provides a Co-based alloy sputtering target. The sputtering target comprises a Co-based alloy phase and a nonmagnetic ternary compound phase including at least one nonmagnetic ternary compound. In addition, the present invention also provides a Co-based alloy material, which is sputtered by using the afore-mentioned sputtering target. Because the nonmagnetic ternary compound is segregated at the grain boundary of cobalt-based alloy grains, it can be used for isolating the magnetic exchange coupling between cobalt-based alloy grains. Because the highly stability of nonmagnetic ternary compound, the required thickness of the grain boundary layer for isolating the magnetic exchange coupling can be reduced. Thus, using the Co-based alloy sputtering target to produce the Co-based alloy material can highly improve the signal-to-noise ratio of the magnetic recording media. |
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Bibliography: | Application Number: TW20120108058 |