Photosensitive resin composition, black matrix, color filter and liquid crystal display element

• Main Authors: TSENG, CHING-YUAN, LIAO, HAO-WEI, LEE, CHUN-HSIEN, WU, MING-JU, SHIH, CHUN-AN
• Format: Patent
• Language: Chinese; English
• Published: 01.06.2013
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; THEIR PREPARATION OR CHEMICAL WORKING-UP

This invention provides a photosensitive resin composition comprising an alkali-soluble resin (A), a polysiloxane (B), a compound (C) containing vinyl unsaturated group(s), a photo initiator (D), a solvent (E) and a black pigment (F). Said alkali-soluble resin (A) comprises a resin (A-1) containing unsaturated group(s), and said resin (A-1) containing unsaturated group(s) is produced by polymerization of a mixture. Said mixture contains a epoxy compound(i) having at least two epoxy groups, and a compound (ii) having at least one vinyl unsaturated group and at least one carboxyl group. The weight ratio is from 0.1 to 3.0 by said resin (A-1) containing unsaturated group(s) and said polysiloxane (B). A black matrix, made from said photosensitive resin composition, has better surface smoothness and excellent stability of surface resistance after heating.