Method to provide a patterned orientation template for a self-assemblable polymer

• Main Authors: PEETERS, EMIEL, VAN DER HEIJDEN, EDDY CORNELIS ANTONIUS, KETELAARS, WILHELMUS SEBASTIANUS MARCUS MARIA, DE RUITER, JESSICA, DRUZHININA, TAMARA, KOOLE, ROELOF, BOOTS, HENRI MARIE JOSEPH, MEESSEN, HIERONYMUS JOHANNUS CHRISTIAAN, BRIZARD, AURELIE MARIE ANDREE, FINDERS, JOZEF MARIA, NGUYEN, THANH TRUNG, WUISTER, SANDER FREDERIK, VAN HEESCH, CHRISTIANUS MARTINUS
• Format: Patent
• Language: Chinese; English
• Published: 16.05.2013
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at e specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.