Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation...
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Main Authors | , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
01.03.2013
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Subjects | |
Online Access | Get full text |
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Summary: | A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate. |
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Bibliography: | Application Number: TW20121128660 |