Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation...

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Bibliographic Details
Main Authors LAURENT, THIBAULT SIMON MATHIEU, KUNNEN, JOHAN GERTRUDIS CORNELIS, HOUBEN, MARTIJN, DERKS, SANDER CATHARINA REINIER, VAN ABEELEN, HENDRIKUS JOHANNES MARINUS, DASSEN, ARMAND ROSA JOZEF
Format Patent
LanguageChinese
English
Published 01.03.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
Bibliography:Application Number: TW20121128660