Standard cell architecture using double poly patterning for multi VT devices

• Main Authors: KAMAL, PRATYUSH, CHIDAMBARAM, PR, PATEL, PRAYAG B, GAN, CHOCK H, SWAMYNATHAN, CHETHAN, VANG, FOUA
• Format: Patent
• Language: Chinese; English
• Published: 16.12.2012
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

An apparatus fabricated using a standard cell architecture including devices having different voltage thresholds may include a first set of polylines associated with a first channel length, where each polyline within the first set of polylines is separated by a substantially constant pitch. The appa...