Sputtering target for forming magnetic recording medium film and method for producing same

Provided are: a sputtering target that is for forming a magnetic recording medium film, is able to form a film having a low ordering temperature, and can suppress the generation of particles; and a method for producing the sputtering target. The sputtering target for forming a magnetic recording med...

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Bibliographic Details
Main Authors ISHIYAMA, KOUICHI, NONAKA, SOHEI, YOSUKE, MASANORI, MATSUZAKI, HIDEHARU
Format Patent
LanguageChinese
English
Published 16.11.2012
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Summary:Provided are: a sputtering target that is for forming a magnetic recording medium film, is able to form a film having a low ordering temperature, and can suppress the generation of particles; and a method for producing the sputtering target. The sputtering target for forming a magnetic recording medium film comprises a sintered body having a composition represented by the general formula {(FexPt100-x)(100-y)Ay}(100-z)Cz, A being a metal comprising Au and/or Cu, and by atomic ratio, 30 = x = 80, 1 = y = 30, and 3 = z = 63. Also, the method for producing the sputtering target has a step for hot pressing a mixed powder of an AuPt alloy powder and/or a CuPt alloy powder, an AgPt alloy powder, an FePt alloy powder, Pt powder, and graphite powder or carbon black powder in a vacuum or in an inert gas atmosphere.
Bibliography:Application Number: TW20120103107