Sputtering target for forming magnetic recording medium film and method for producing same
Provided are: a sputtering target that is for forming a magnetic recording medium film, is able to form a film having a low ordering temperature, and can suppress the generation of particles; and a method for producing the sputtering target. The sputtering target for forming a magnetic recording med...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
16.11.2012
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Subjects | |
Online Access | Get full text |
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Summary: | Provided are: a sputtering target that is for forming a magnetic recording medium film, is able to form a film having a low ordering temperature, and can suppress the generation of particles; and a method for producing the sputtering target. The sputtering target for forming a magnetic recording medium film comprises a sintered body having a composition represented by the general formula {(FexPt100-x)(100-y)Ay}(100-z)Cz, A being a metal comprising Au and/or Cu, and by atomic ratio, 30 = x = 80, 1 = y = 30, and 3 = z = 63. Also, the method for producing the sputtering target has a step for hot pressing a mixed powder of an AuPt alloy powder and/or a CuPt alloy powder, an AgPt alloy powder, an FePt alloy powder, Pt powder, and graphite powder or carbon black powder in a vacuum or in an inert gas atmosphere. |
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Bibliography: | Application Number: TW20120103107 |