Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder

• Main Authors: TROMP, SIEGFRIED ALEXANDER, RODENBURG, ELISABETH CORINNE, LAFARRE, RAYMOND WILHELMUS LOUIS, LEIJSSEN, JACOBUS JOSEPHUS, HUISMAN, HENDRIK, TEN KATE, NICOLAAS, KARADE, YOGESH PRAMOD, DZIOMKINA, NINA VLADIMIROVNA, FEIJTS, MAURICE WILHELMUS LEONARDUS HENDRICUS
• Format: Patent
• Language: Chinese; English
• Published: 16.10.2012
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CINEMATOGRAPHY; COLORIMETRY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT; MEASURING; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; RADIATION PYROMETRY; SPRAYING OR ATOMISING IN GENERAL; TESTING; TRANSPORTING

A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.