Lithographic apparatus and device manufacturing method

• Main Authors: KUSTERS, GERARDUS ADRIANUS ANTONIUS MARIA, VAN DER MEULEN, FRITS, SIMONS, WILHELMUS FRANCISCUS JOHANNES, DE JONG, FREDERIK EDUARD, CUIJPERS, MARTINUS AGNES WILLEM, OTTENS, JOOST JEROEN, CADEE, THEODORUS PETRUS MARIA, VAN BAREN, MARTIJN, JANSEN, ROBERT, SMEETS, MARTIN FRANS PIERRE, LEENDERS, MARTINUS HENDRIKUS ANTONIUS, MAURICE, WIJCKMANS, VAN GOMPEL, EDWIN AUGUSTINUS MATHEUS
• Format: Patent
• Language: Chinese; English
• Published: 01.06.2012
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; BLASTING; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS; HEATING; HOLOGRAPHY; JOINTS OR FITTINGS FOR PIPES; LIGHTING; MATERIALS THEREFOR; MEANS FOR THERMAL INSULATION IN GENERAL; MECHANICAL ENGINEERING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PIPES; SEMICONDUCTOR DEVICES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; THERMAL INSULATION IN GENERAL; WEAPONS

A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate, the substrate table comprising a conditioning system configured to hold a conditioning fluid and to condition the substrate table, wherein the conditioning system comprises a pressure damper in fluid communication with the conditioning system and arranged to dampen a pressure variation in the conditioning system.