Microlithographic illumination method as well as a projection illumination system for carrying out the method

In an illumination method for illuminating a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection illumination system for performing that method output radiation directed at the substrate and having an output polarization state is produced. B...

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Main Authors GOEHNERMEIER, AKSEL, KRAEHMER, DANIEL, SCHWAB, MARKUS, BROTSACK, MARKUS, GRUNER, TORALF, TOTZECK, MICHAEL, DIECKMANN, NILS, WANGLER, JOHANNES
Format Patent
LanguageChinese
English
Published 01.06.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:In an illumination method for illuminating a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection illumination system for performing that method output radiation directed at the substrate and having an output polarization state is produced. By means of a variable adjustment of the output polarization state with the aid of at least one polarization manipulation device the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
Bibliography:Application Number: TW20110142279