Article and method for bonding substrates with large topographies

The present invention is an article useful in the field of wafer processing, for example. The article includes a substrate, a leveling layer, a joining layer, a photothermal conversion layer and a temporary carrier. The substrate has a first major surface, a second major surface and at least one thr...

Full description

Saved in:
Bibliographic Details
Main Authors LARSON, ERIC GEORGE, MAHONEY, WAYNE SCOTT, WEBB, RICHARD JAMES
Format Patent
LanguageChinese
English
Published 01.04.2012
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The present invention is an article useful in the field of wafer processing, for example. The article includes a substrate, a leveling layer, a joining layer, a photothermal conversion layer and a temporary carrier. The substrate has a first major surface, a second major surface and at least one three dimensional topographical feature extending from the first major surface and having an initial step height. The leveling layer is positioned adjacent to the first major surface and reduces a topography of the substrate to between about 5% and about 95% of the initial step height. The joining layer is positioned adjacent to the leveling layer and further reduces the topography of the substrate to less than about 20% of the initial step height. The photothermal conversion layer is positioned adjacent to the joining layer and the temporary carrier is positioned adjacent the photothermal conversion layer.
Bibliography:Application Number: TW20110127789