Lithographic apparatus and device manufacturing method

A lithographic apparatus includes an optical column configured to create a pattern on a target portion of a substrate, the optical column including a controllable element configured to provide a beam; and a projection system configured to project the beam onto the target portion; an actuator configu...

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Bibliographic Details
Main Authors ONVLEE, JOHANNES, KOPPELMANS, JOHANNES FRANCISCUS ALOYSIUS, VAN ZWET, ERWIN JOHN
Format Patent
LanguageChinese
English
Published 01.11.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A lithographic apparatus includes an optical column configured to create a pattern on a target portion of a substrate, the optical column including a controllable element configured to provide a beam; and a projection system configured to project the beam onto the target portion; an actuator configured to move at least a part of the optical column with respect to the substrate; a measurement system configured to measure a position of the at least part of the optical column; and a controller configured to drive the controllable element, the controller being provided with an output signal of the measurement system.
Bibliography:Application Number: TW20110106086