Lithographic method and apparatus

A lithographic method includes controlling a phase adjuster of a lithographic apparatus, the phase adjuster being constructed and arranged to adjust a phase of an electric field of a radiation beam traversing an optical element of the phase adjuster, and controlling a signal provided to the phase ad...

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Bibliographic Details
Main Author AKHSSAY, M'HAMED
Format Patent
LanguageChinese
English
Published 01.11.2011
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Summary:A lithographic method includes controlling a phase adjuster of a lithographic apparatus, the phase adjuster being constructed and arranged to adjust a phase of an electric field of a radiation beam traversing an optical element of the phase adjuster, and controlling a signal provided to the phase adjuster that results in an actual time-temperature characteristic of a portion of the optical element, the control being undertaken with reference to a desired time-temperature characteristic of a portion of the optical element, the control of the signal being such that a change in the actual time-temperature characteristic precedes a related change in the desired time-temperature characteristic.
Bibliography:Application Number: TW20100135485